Application of static masking technique in magnetron sputtering technology for the production of linearly variable filters

Variable filters are key components for compact spectral imagers. In this paper, we present a method the fabrication of linearly variable based on Bühler HELIOS machine (plasma assisted reactive magnetron sputtering). These obtained by producing variation thickness all layers coating, using adapted masks placed in between sputtering targets low and high refractive index materials substrates. band pass filter from 550 up to 1000 nm is demonstrated.